Newly developed positive-tone resists for Posi/Posi double patterning process

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Authors
Nakamura, Tsuyoshi; Takeshita, Masaru; Maemori, Satoshi; Uchida, Ryusuke; Takasu, Ryoichi; Ohmori, Katsumi
Conference
Advances in Resist Materials and Processing Technolgy XXVI
Title
Newly developed positive-tone resists for Posi/Posi double patterning process
Publication type
Proceedings paper
Embargo date
9999-12-31
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