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Vapor phase doping and sub-melt laser anneal for ultra-shallow extension junctions in sub-32 nm CMOS technology

dc.contributor.authorNguyen, Duy
dc.contributor.authorRosseel, Erik
dc.contributor.authorTakeuchi, Shotaro
dc.contributor.authorEveraert, Jean-Luc
dc.contributor.authorLoo, Roger
dc.contributor.authorGoossens, Jozefien
dc.contributor.authorMoussa, Alain
dc.contributor.authorClarysse, Trudo
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-18T01:08:18Z
dc.date.available2021-10-18T01:08:18Z
dc.date.issued2009-09
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15920
dc.sourceIIOimport
dc.titleVapor phase doping and sub-melt laser anneal for ultra-shallow extension junctions in sub-32 nm CMOS technology
dc.typeProceedings paper
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorEveraert, Jean-Luc
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecEveraert, Jean-Luc::0000-0002-0660-9090
dc.contributor.orcidimecMoussa, Alain::0000-0002-6377-4199
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage87
dc.source.endpage88
dc.source.conference1st International Workshop on Si based Nano-Electronics and -Photonics (SiNEP-09)
dc.source.conferencedate20/09/2009
dc.source.conferencelocationVigo Spain
imec.availabilityPublished - imec


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