dc.contributor.author | Ortolland, Claude | |
dc.contributor.author | Mathew, Suraj | |
dc.contributor.author | Duffy, Ray | |
dc.contributor.author | Saino, Kanta | |
dc.contributor.author | Kim, Chul Sung | |
dc.contributor.author | Mertens, Sofie | |
dc.contributor.author | Horiguchi, Naoto | |
dc.contributor.author | Vrancken, Christa | |
dc.contributor.author | Chiarella, Thomas | |
dc.contributor.author | Kerner, Christoph | |
dc.contributor.author | Absil, Philippe | |
dc.contributor.author | Lauwers, Anne | |
dc.contributor.author | Biesemans, Serge | |
dc.contributor.author | Hoffmann, Thomas Y. | |
dc.date.accessioned | 2021-10-18T01:18:30Z | |
dc.date.available | 2021-10-18T01:18:30Z | |
dc.date.issued | 2009 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/15949 | |
dc.source | IIOimport | |
dc.title | Carbon-based thermal stabilization techniques for junction and silicide engineering for high performance CMOS periphery in memory applications | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Mertens, Sofie | |
dc.contributor.imecauthor | Horiguchi, Naoto | |
dc.contributor.imecauthor | Vrancken, Christa | |
dc.contributor.imecauthor | Chiarella, Thomas | |
dc.contributor.imecauthor | Kerner, Christoph | |
dc.contributor.imecauthor | Absil, Philippe | |
dc.contributor.imecauthor | Lauwers, Anne | |
dc.contributor.imecauthor | Biesemans, Serge | |
dc.contributor.orcidimec | Mertens, Sofie::0000-0002-1482-6730 | |
dc.contributor.orcidimec | Horiguchi, Naoto::0000-0001-5490-0416 | |
dc.contributor.orcidimec | Chiarella, Thomas::0000-0002-6155-9030 | |
dc.source.peerreview | no | |
dc.source.beginpage | 147 | |
dc.source.endpage | 150 | |
dc.source.conference | 10th International Conference on Ultimate Integration of Silicon - ULIS | |
dc.source.conferencedate | 18/03/2009 | |
dc.source.conferencelocation | Aachen Germany | |
imec.availability | Published - imec | |