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Optimized ultra-low thermal budget process flow for advanced high-K / metal gate first CMOS using laser-annealing technology

dc.contributor.authorOrtolland, Claude
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorFavia, Paola
dc.contributor.authorRichard, Olivier
dc.contributor.authorKerner, Christoph
dc.contributor.authorChiarella, Thomas
dc.contributor.authorRosseel, Erik
dc.contributor.authorOkuno, Yasutoshi
dc.contributor.authorAkheyar, Amal
dc.contributor.authorTseng, Joshua
dc.contributor.authorEveraert, Jean-Luc
dc.contributor.authorSchram, Tom
dc.contributor.authorKubicek, Stefan
dc.contributor.authorAoulaiche, Marc
dc.contributor.authorCho, Moon Ju
dc.contributor.authorAbsil, Philippe
dc.contributor.authorBiesemans, Serge
dc.contributor.authorHoffmann, Thomas Y.
dc.date.accessioned2021-10-18T01:19:21Z
dc.date.available2021-10-18T01:19:21Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15951
dc.sourceIIOimport
dc.titleOptimized ultra-low thermal budget process flow for advanced high-K / metal gate first CMOS using laser-annealing technology
dc.typeProceedings paper
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorKerner, Christoph
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorEveraert, Jean-Luc
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage38
dc.source.endpage39
dc.source.conferenceSymposium on VLSI Technology
dc.source.conferencedate15/06/2009
dc.source.conferencelocationKyoto Japan
imec.availabilityPublished - open access


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