Authors

Osaki, Mayuka; Tanaka, Maki; Shishido, Chie; Cheng, Shaunee; Laidler, David; Ercken, Monique; Altamirano Sanchez, Efrain

Conference

Metrology, Inspection, and Process Control for Microlithography XXIII

Title

Performance verification of resist loss measurement method using top-view CD-SEM images for hyper-NA lithography

Publication type

Proceedings paper

Embargo date

9999-12-31