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Impact of different etch steps on metal gate etch process

dc.contributor.authorParaschiv, Vasile
dc.contributor.authorVecchio, Emma
dc.contributor.authorBoullart, Werner
dc.date.accessioned2021-10-18T01:27:19Z
dc.date.available2021-10-18T01:27:19Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15973
dc.sourceIIOimport
dc.titleImpact of different etch steps on metal gate etch process
dc.typeMeeting abstract
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorVecchio, Emma
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference2nd International PESM Workshop on Plasma Etch and Strip in Microelectronics - PESM
dc.source.conferencedate26/07/2009
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - open access


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