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Thickness dependent residual stress in polycrystalline aluminum nitride thin films

dc.contributor.authorPobedinskas, P.
dc.contributor.authorMortet, Vincent
dc.contributor.authorHaenen, Ken
dc.date.accessioned2021-10-18T01:46:27Z
dc.date.available2021-10-18T01:46:27Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16029
dc.sourceIIOimport
dc.titleThickness dependent residual stress in polycrystalline aluminum nitride thin films
dc.typeMeeting abstract
dc.contributor.imecauthorHaenen, Ken
dc.contributor.orcidimecHaenen, Ken::0000-0001-6711-7367
dc.source.peerreviewno
dc.source.conferenceInnovations in Thin Film Processing and Characterisation - ITFPC
dc.source.conferencedate17/11/2009
dc.source.conferencelocationNancy France
imec.availabilityPublished - imec


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