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Measurement and analysis of EUV photoresist related outgassing and contamination

dc.contributor.authorPollentier, Ivan
dc.contributor.authorAksenov, German
dc.contributor.authorGoethals, Mieke
dc.contributor.authorGronheid, Roel
dc.contributor.authorJonckheere, Rik
dc.contributor.authorLeeson, Michael
dc.date.accessioned2021-10-18T01:47:12Z
dc.date.available2021-10-18T01:47:12Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16031
dc.sourceIIOimport
dc.titleMeasurement and analysis of EUV photoresist related outgassing and contamination
dc.typeProceedings paper
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage727146
dc.source.conferenceAlternative Lithographic Technologies
dc.source.conferencedate22/02/2009
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol.7271


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