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Characterisation of EUV resist related outgassing and contamination

dc.contributor.authorPollentier, Ivan
dc.contributor.authorBerger, Margaux
dc.contributor.authorGoethals, Mieke
dc.contributor.authorGronheid, Roel
dc.contributor.authorLeeson, Michael
dc.date.accessioned2021-10-18T01:47:33Z
dc.date.available2021-10-18T01:47:33Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16032
dc.sourceIIOimport
dc.titleCharacterisation of EUV resist related outgassing and contamination
dc.typeProceedings paper
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorGronheid, Roel
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography
dc.source.conferencedate18/10/2009
dc.source.conferencelocationPrague Czech Republic
imec.availabilityPublished - open access
imec.internalnotese-proceedings Sematech-website


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