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Metrology for implanted Si substrate and dopant loss studies

dc.contributor.authorRadisic, Dunja
dc.contributor.authorShamiryan, Denis
dc.contributor.authorMannaert, Geert
dc.contributor.authorBoullart, Werner
dc.contributor.authorRosseel, Erik
dc.contributor.authorBogdanowicz, Janusz
dc.contributor.authorGoossens, Jozefien
dc.contributor.authorMarrant, Koen
dc.contributor.authorBender, Hugo
dc.date.accessioned2021-10-18T02:03:00Z
dc.date.available2021-10-18T02:03:00Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16072
dc.sourceIIOimport
dc.titleMetrology for implanted Si substrate and dopant loss studies
dc.typeMeeting abstract
dc.contributor.imecauthorRadisic, Dunja
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorBogdanowicz, Janusz
dc.contributor.imecauthorBender, Hugo
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecBogdanowicz, Janusz::0000-0002-7503-8922
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage2160
dc.source.conference216th ECS Meeting
dc.source.conferencedate4/10/2009
dc.source.conferencelocationVienna Austria
imec.availabilityPublished - open access
imec.internalnotesMeeting Abstracts; Vol. MA2009-02


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