dc.contributor.author | Rafi, J.M. | |
dc.contributor.author | Simoen, Eddy | |
dc.contributor.author | Mercha, Abdelkarim | |
dc.contributor.author | Collaert, Nadine | |
dc.contributor.author | Campabadal, F. | |
dc.contributor.author | Claeys, Cor | |
dc.date.accessioned | 2021-10-18T02:04:13Z | |
dc.date.available | 2021-10-18T02:04:13Z | |
dc.date.issued | 2009 | |
dc.identifier.issn | 1071-1023 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/16075 | |
dc.source | IIOimport | |
dc.title | Progressive degradation of TiN/SiON and TiN'/HfO2 gate stack triple gate SOI nFinFETs subjected to electrical stress | |
dc.type | Journal article | |
dc.contributor.imecauthor | Simoen, Eddy | |
dc.contributor.imecauthor | Mercha, Abdelkarim | |
dc.contributor.imecauthor | Collaert, Nadine | |
dc.contributor.orcidimec | Simoen, Eddy::0000-0002-5218-4046 | |
dc.contributor.orcidimec | Mercha, Abdelkarim::0000-0002-2174-6958 | |
dc.contributor.orcidimec | Collaert, Nadine::0000-0002-8062-3165 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 453 | |
dc.source.endpage | 458 | |
dc.source.journal | Journal of Vacuum Science and Technology B | |
dc.source.issue | 1 | |
dc.source.volume | 27 | |
imec.availability | Published - open access | |