Show simple item record

Transmission electron diffraction techniques for nm scale strain measurement in semiconductors

dc.contributor.authorVanhellemont, Jan
dc.contributor.authorJanssens, Koenraad
dc.contributor.authorFrabboni, S.
dc.contributor.authorSmeys, Peter
dc.contributor.authorBalboni, R.
dc.contributor.authorArmigliato, A.
dc.date.accessioned2021-09-29T15:44:15Z
dc.date.available2021-09-29T15:44:15Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1608
dc.sourceIIOimport
dc.titleTransmission electron diffraction techniques for nm scale strain measurement in semiconductors
dc.typeProceedings paper
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage479
dc.source.endpage490
dc.source.conferenceDiagnostic Techniques for Semiconductor Materials Processing II
dc.source.conferencedate27/11/1995
dc.source.conferencelocationBoston, MA USA
imec.availabilityPublished - open access
imec.internalnotesMRS Symposium Proceedings; Vol. 406


Files in this item

Thumbnail
Name:
1583.pdf
Size:
916.9Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record