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Status and challenges of extreme-UV lithography

dc.contributor.authorRonse, Kurt
dc.contributor.authorHendrickx, Eric
dc.contributor.authorGoethals, Mieke
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-18T02:27:25Z
dc.date.available2021-10-18T02:27:25Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16135
dc.sourceIIOimport
dc.titleStatus and challenges of extreme-UV lithography
dc.typeProceedings paper
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage98
dc.source.endpage99
dc.source.conferenceInternational Symposium on VLSI Technology, Systems and Apllications - VLSI-TSA
dc.source.conferencedate27/04/2009
dc.source.conferencelocationHsinchu Taiwan
imec.availabilityPublished - open access


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