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Extreme scaling of optical lithography: overview of process integration issues

dc.contributor.authorRonse, Kurt
dc.contributor.authorWiaux, Vincent
dc.contributor.authorVerhaegen, Staf
dc.contributor.authorVan Look, Lieve
dc.contributor.authorBekaert, Joost
dc.contributor.authorLaidler, David
dc.contributor.authorCheng, Shaunee
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorDusa, Mircea
dc.date.accessioned2021-10-18T02:28:17Z
dc.date.available2021-10-18T02:28:17Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16137
dc.sourceIIOimport
dc.titleExtreme scaling of optical lithography: overview of process integration issues
dc.typeOral presentation
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorLaidler, David
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorDusa, Mircea
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecLaidler, David::0000-0003-4055-3366
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceOptical Microlithography XXII
dc.source.conferencedate22/02/2009
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesInvited keynote


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