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ESD on-wafer characterization: Is TLP still the right measurement tool?

dc.contributor.authorScholz, Mirko
dc.contributor.authorLinten, Dimitri
dc.contributor.authorThijs, Steven
dc.contributor.authorSangameswaran, Sandeep
dc.contributor.authorSawada, Masanori
dc.contributor.authorNakaie, T.
dc.contributor.authorHasebe, Takumi
dc.contributor.authorGroeseneken, Guido
dc.date.accessioned2021-10-18T02:43:47Z
dc.date.available2021-10-18T02:43:47Z
dc.date.issued2009-10
dc.identifier.issn0018-9456
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16176
dc.sourceIIOimport
dc.titleESD on-wafer characterization: Is TLP still the right measurement tool?
dc.typeJournal article
dc.contributor.imecauthorLinten, Dimitri
dc.contributor.imecauthorThijs, Steven
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.orcidimecLinten, Dimitri::0000-0001-8434-1838
dc.contributor.orcidimecThijs, Steven::0000-0003-2889-8345
dc.source.peerreviewyes
dc.source.beginpage3418
dc.source.endpage3426
dc.source.journalIEEE Transactions on Instrumentation and Measurement
dc.source.issue10
dc.source.volume58
imec.availabilityPublished - imec


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