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Cleaning and strip requirement for metal gate based CMOS integration

dc.contributor.authorSchram, Tom
dc.contributor.authorSebaai, Farid
dc.contributor.authorClaes, Martine
dc.contributor.authorVos, Rita
dc.contributor.authorWada, Masayuli
dc.contributor.authorRohr, Erika
dc.contributor.authorKubicek, Stefan
dc.date.accessioned2021-10-18T02:45:28Z
dc.date.available2021-10-18T02:45:28Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16180
dc.sourceIIOimport
dc.titleCleaning and strip requirement for metal gate based CMOS integration
dc.typeMeeting abstract
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorSebaai, Farid
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorKubicek, Stefan
dc.source.peerreviewyes
dc.source.beginpage2085
dc.source.conference216th ECS Meeting
dc.source.conferencedate4/10/2009
dc.source.conferencelocationVienna Austria
imec.availabilityPublished - imec
imec.internalnotesMeeting Abstracts; Vol. MA2009-02


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