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Surface-charge lithography for the fabrication of gallium nitride based gas sensors

dc.contributor.authorSchuller, Tim
dc.contributor.authorHeard, Peter
dc.contributor.authorPopa, Veaceslav
dc.contributor.authorVolciuc, Olesea
dc.contributor.authorTiginyanu, Ion
dc.contributor.authorDas, Jo
dc.contributor.authorDegroote, Stefan
dc.contributor.authorGermain, Marianne
dc.contributor.authorSarua, Andrei
dc.contributor.authorKuball, Martin
dc.date.accessioned2021-10-18T02:46:34Z
dc.date.available2021-10-18T02:46:34Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16183
dc.sourceIIOimport
dc.titleSurface-charge lithography for the fabrication of gallium nitride based gas sensors
dc.typeMeeting abstract
dc.source.peerreviewno
dc.source.beginpageI6.7
dc.source.conferenceMRS Fall Meeting Symposium I: III-Nitride Materials for Sensing, Energy Conversion, and Controlled Light-Matter Interactions
dc.source.conferencedate30/11/2009
dc.source.conferencelocationBoston, MA USA
imec.availabilityPublished - imec


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