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Fabrication of photonic wire and crystal circuits in silicon-on-insulator using 193nm optical lithography

dc.contributor.authorSelvaraja, Shankar
dc.contributor.authorJaenen, Patrick
dc.contributor.authorBogaerts, Wim
dc.contributor.authorVan Thourhout, Dries
dc.contributor.authorDumon, Pieter
dc.contributor.authorBaets, Roel
dc.date.accessioned2021-10-18T02:52:11Z
dc.date.available2021-10-18T02:52:11Z
dc.date.issued2009-01
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16197
dc.sourceIIOimport
dc.titleFabrication of photonic wire and crystal circuits in silicon-on-insulator using 193nm optical lithography
dc.typeJournal article
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorBogaerts, Wim
dc.contributor.imecauthorVan Thourhout, Dries
dc.contributor.imecauthorBaets, Roel
dc.contributor.orcidimecBogaerts, Wim::0000-0003-1112-8950
dc.contributor.orcidimecVan Thourhout, Dries::0000-0003-0111-431X
dc.contributor.orcidimecBaets, Roel::0000-0003-1266-1319
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage4076
dc.source.endpage4083
dc.source.journalIEEE Journal of Lightwave Technology
dc.source.issue18
dc.source.volume27
imec.availabilityPublished - open access


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