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High-precision contouring from SEM image in 32-nm lithography and beyond

dc.contributor.authorShindo, Hiroyuki
dc.contributor.authorSugiyama, Akiyuki
dc.contributor.authorKomuro, Hitoshi
dc.contributor.authorHojyo, Yutaka
dc.contributor.authorMatsuoka, Ryoichi
dc.contributor.authorSturtevant, John
dc.contributor.authorDo, Thuy
dc.contributor.authorKusnadi, Ir
dc.contributor.authorFenger, Germain
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorVan de Kerkhove, Jeroen
dc.date.accessioned2021-10-18T03:00:34Z
dc.date.available2021-10-18T03:00:34Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16218
dc.sourceIIOimport
dc.titleHigh-precision contouring from SEM image in 32-nm lithography and beyond
dc.typeProceedings paper
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorVan de Kerkhove, Jeroen
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage72751F
dc.source.conferenceDesign for Manufacturability through Design-Process Integration III
dc.source.conferencedate22/02/2009
dc.source.conferencelocationSan Jose; CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 7275


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