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A conformal oxide liner for through silicon vias by pulsed SA-CVD deposition

dc.contributor.authorSleeckx, Erik
dc.contributor.authorSchaekers, Marc
dc.contributor.authorDurr, Emma
dc.date.accessioned2021-10-18T03:12:49Z
dc.date.available2021-10-18T03:12:49Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16245
dc.sourceIIOimport
dc.titleA conformal oxide liner for through silicon vias by pulsed SA-CVD deposition
dc.typeProceedings paper
dc.contributor.imecauthorSleeckx, Erik
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.orcidimecSleeckx, Erik::0000-0003-2560-6132
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage359
dc.source.endpage666
dc.source.conferenceEuroCVD 17 / CVD 17
dc.source.conferencedate4/10/2009
dc.source.conferencelocationVienna Austria
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 25; Issue 8


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