dc.contributor.author | Sleeckx, Erik | |
dc.contributor.author | Schaekers, Marc | |
dc.contributor.author | Durr, Emma | |
dc.date.accessioned | 2021-10-18T03:13:11Z | |
dc.date.available | 2021-10-18T03:13:11Z | |
dc.date.issued | 2009 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/16246 | |
dc.source | IIOimport | |
dc.title | A conformal oxide liner for through silicon vias by pulsed SA-CVD deposition | |
dc.type | Meeting abstract | |
dc.contributor.imecauthor | Sleeckx, Erik | |
dc.contributor.imecauthor | Schaekers, Marc | |
dc.contributor.orcidimec | Sleeckx, Erik::0000-0003-2560-6132 | |
dc.contributor.orcidimec | Schaekers, Marc::0000-0002-1496-7816 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 2566 | |
dc.source.conference | 216th ECS Meeting | |
dc.source.conferencedate | 4/10/2009 | |
dc.source.conferencelocation | Vienna Austria | |
imec.availability | Published - open access | |
imec.internalnotes | Meeting Abstracts; Vol. MA 2009-02 | |