Show simple item record

Fluorinated polymethacrylates as highly sensitive non-chemically amplified e-beam resists

dc.contributor.authorStraham, Jeffrey
dc.contributor.authorAdams, Jacob
dc.contributor.authorJen, Wei-Lun
dc.contributor.authorVanleenhove, Anja
dc.contributor.authorNeikirk, Colin
dc.contributor.authorRochelle, Timothy
dc.contributor.authorGronheid, Roel
dc.contributor.authorWillson, Grant
dc.date.accessioned2021-10-18T03:24:58Z
dc.date.available2021-10-18T03:24:58Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16276
dc.sourceIIOimport
dc.titleFluorinated polymethacrylates as highly sensitive non-chemically amplified e-beam resists
dc.typeProceedings paper
dc.contributor.imecauthorVanleenhove, Anja
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage72733G
dc.source.conferenceAdvances in Resist Materials and Processing Technology XXVI
dc.source.conferencedate22/02/2009
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; Vol. 7273


Files in this item

Thumbnail
Name:
17917.pdf
Size:
249.6Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record