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Ultimate contact hole resolution using immersion lithography with line/space imaging

dc.contributor.authorTruffert, Vincent
dc.contributor.authorBekaert, Joost
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorMiller, Andy
dc.contributor.authorMoelants, Myriam
dc.contributor.authorWu, Timothy
dc.date.accessioned2021-10-18T03:44:17Z
dc.date.available2021-10-18T03:44:17Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16325
dc.sourceIIOimport
dc.titleUltimate contact hole resolution using immersion lithography with line/space imaging
dc.typeProceedings paper
dc.contributor.imecauthorTruffert, Vincent
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorMiller, Andy
dc.contributor.imecauthorMoelants, Myriam
dc.contributor.orcidimecTruffert, Vincent::0000-0001-7851-830X
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage72740N
dc.source.conferenceOptical Microlithography XXII
dc.source.conferencedate22/02/2009
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol.7274


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