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Application of plasma etch processes to gallium arsenide technology

dc.contributor.authorTutunjyan, Nina
dc.contributor.authorSakharova, Tania
dc.contributor.authorKalandadze, Givi
dc.contributor.authorPavliashvili, Tamaz
dc.contributor.authorKhuchua, Nina
dc.date.accessioned2021-10-18T03:47:18Z
dc.date.available2021-10-18T03:47:18Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16332
dc.sourceIIOimport
dc.titleApplication of plasma etch processes to gallium arsenide technology
dc.typeProceedings paper
dc.contributor.imecauthorTutunjyan, Nina
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.conference2nd Plasma Etch and Strip in Microelectronics Workshop - PESM
dc.source.conferencedate26/02/2009
dc.source.conferencelocationLeuven Belgium
dc.identifier.urlwww.pesm2009.be
imec.availabilityPublished - open access


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