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Porogen residue free ultra low-k PECVD material: fabrication, optical and mechanical properties

dc.contributor.authorUrbanowicz, Adam
dc.contributor.authorVanstreels, Kris
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorCremel, Maxime
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-18T03:49:55Z
dc.date.available2021-10-18T03:49:55Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16338
dc.sourceIIOimport
dc.titlePorogen residue free ultra low-k PECVD material: fabrication, optical and mechanical properties
dc.typeMeeting abstract
dc.contributor.imecauthorVanstreels, Kris
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecVanstreels, Kris::0000-0002-4420-0966
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.conferenceAdvanced Metalization Conference
dc.source.conferencedate13/10/2009
dc.source.conferencelocationBaltimore, MD USA
imec.availabilityPublished - imec


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