Show simple item record

Characterizing immersion lithography micro bridge defects using advanced features of teh SEMVision G3 STAR FIB

dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorSantoro, Gaetano
dc.contributor.authorGronheid, Roel
dc.contributor.authorBraggin, Jennifer
dc.contributor.authorRosslee, Craig
dc.contributor.authorLeray, Philippe
dc.contributor.authorCheng, Shaunee
dc.contributor.authorSchreutelkamp, Rob
dc.contributor.authorHillel, Noam
dc.date.accessioned2021-10-18T04:01:37Z
dc.date.available2021-10-18T04:01:37Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16367
dc.sourceIIOimport
dc.titleCharacterizing immersion lithography micro bridge defects using advanced features of teh SEMVision G3 STAR FIB
dc.typeProceedings paper
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorSantoro, Gaetano
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorLeray, Philippe
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference6th International Symposium on Immersion Lithography Extensions
dc.source.conferencedate22/10/2009
dc.source.conferencelocationPrague Czech Republic
imec.availabilityPublished - open access
imec.internalnotese-proceedings website Sematech


Files in this item

Thumbnail
Name:
19617.pdf
Size:
265.9Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record