dc.contributor.author | Vandenberghe, Geert | |
dc.contributor.author | Hendrickx, Eric | |
dc.contributor.author | Goethals, Mieke | |
dc.contributor.author | Jonckheere, Rik | |
dc.contributor.author | Gronheid, Roel | |
dc.contributor.author | Ronse, Kurt | |
dc.date.accessioned | 2021-10-18T04:22:53Z | |
dc.date.available | 2021-10-18T04:22:53Z | |
dc.date.issued | 2009 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/16418 | |
dc.source | IIOimport | |
dc.title | EUV lithography development progress in IMEC | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Vandenberghe, Geert | |
dc.contributor.imecauthor | Hendrickx, Eric | |
dc.contributor.imecauthor | Jonckheere, Rik | |
dc.contributor.imecauthor | Gronheid, Roel | |
dc.contributor.imecauthor | Ronse, Kurt | |
dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.conference | SPIE Lithography Asia | |
dc.source.conferencedate | 18/11/2009 | |
dc.source.conferencelocation | Taipei Taiwan | |
imec.availability | Published - open access | |