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Spacer self aligned double patterning: process control

dc.contributor.authorVandeweyer, Tom
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorVangoidsenhoven, Diziana
dc.contributor.authorMurdoch, Gayle
dc.contributor.authorGroenendijk, Remco
dc.contributor.authorHepp, Birgitt
dc.contributor.authorMos, Evert
dc.contributor.authorFinders, Jo
dc.contributor.authorVleeming, Bert
dc.contributor.authorDusa, Mircea
dc.contributor.authorMaenhoudt, Mireille
dc.date.accessioned2021-10-18T04:29:51Z
dc.date.available2021-10-18T04:29:51Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16435
dc.sourceIIOimport
dc.titleSpacer self aligned double patterning: process control
dc.typeOral presentation
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorVangoidsenhoven, Diziana
dc.contributor.imecauthorMurdoch, Gayle
dc.contributor.imecauthorDusa, Mircea
dc.source.peerreviewno
dc.source.conference10th ASML Technology Conference
dc.source.conferencedate24/06/2009
dc.source.conferencelocationVeldhoven Nederland
imec.availabilityPublished - imec


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