dc.contributor.author | Vandeweyer, Tom | |
dc.contributor.author | Maenhoudt, Mireille | |
dc.contributor.author | Vangoidsenhoven, Diziana | |
dc.contributor.author | Gronheid, Roel | |
dc.contributor.author | Versluijs, Janko | |
dc.contributor.author | Miller, Andy | |
dc.contributor.author | Bekaert, Joost | |
dc.contributor.author | Truffert, Vincent | |
dc.contributor.author | Wiaux, Vincent | |
dc.date.accessioned | 2021-10-18T04:30:22Z | |
dc.date.available | 2021-10-18T04:30:22Z | |
dc.date.issued | 2009 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/16436 | |
dc.source | IIOimport | |
dc.title | Advanced optical lithography: double patterning options for 32 and 22nm node | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Vandeweyer, Tom | |
dc.contributor.imecauthor | Vangoidsenhoven, Diziana | |
dc.contributor.imecauthor | Gronheid, Roel | |
dc.contributor.imecauthor | Versluijs, Janko | |
dc.contributor.imecauthor | Miller, Andy | |
dc.contributor.imecauthor | Bekaert, Joost | |
dc.contributor.imecauthor | Truffert, Vincent | |
dc.contributor.imecauthor | Wiaux, Vincent | |
dc.contributor.orcidimec | Bekaert, Joost::0000-0003-3075-3479 | |
dc.contributor.orcidimec | Truffert, Vincent::0000-0001-7851-830X | |
dc.source.peerreview | no | |
dc.source.conference | 2nd International Workshop on Plasma Etch and Strip in Microelectronics - PESM | |
dc.source.conferencedate | 26/02/2009 | |
dc.source.conferencelocation | Leuven Belgium | |
imec.availability | Published - imec | |