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Advanced optical lithography: double patterning options for 32 and 22nm node

dc.contributor.authorVandeweyer, Tom
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorVangoidsenhoven, Diziana
dc.contributor.authorGronheid, Roel
dc.contributor.authorVersluijs, Janko
dc.contributor.authorMiller, Andy
dc.contributor.authorBekaert, Joost
dc.contributor.authorTruffert, Vincent
dc.contributor.authorWiaux, Vincent
dc.date.accessioned2021-10-18T04:30:22Z
dc.date.available2021-10-18T04:30:22Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16436
dc.sourceIIOimport
dc.titleAdvanced optical lithography: double patterning options for 32 and 22nm node
dc.typeOral presentation
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorVangoidsenhoven, Diziana
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorMiller, Andy
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorTruffert, Vincent
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecTruffert, Vincent::0000-0001-7851-830X
dc.source.peerreviewno
dc.source.conference2nd International Workshop on Plasma Etch and Strip in Microelectronics - PESM
dc.source.conferencedate26/02/2009
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - imec


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