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Advanced FinFET devices for sub-32nm technology nodes: characteristics and integration challenges

dc.contributor.authorVeloso, Anabela
dc.contributor.authorCollaert, Nadine
dc.contributor.authorDe Keersgieter, An
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorRooyackers, Rita
dc.contributor.authorHoffmann, Thomas
dc.contributor.authorBiesemans, Serge
dc.contributor.authorJurczak, Gosia
dc.date.accessioned2021-10-18T04:36:55Z
dc.date.available2021-10-18T04:36:55Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16452
dc.sourceIIOimport
dc.titleAdvanced FinFET devices for sub-32nm technology nodes: characteristics and integration challenges
dc.typeMeeting abstract
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorDe Keersgieter, An
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.contributor.orcidimecDe Keersgieter, An::0000-0002-5527-8582
dc.source.peerreviewno
dc.source.beginpage935
dc.source.conference215th Electrochemical Society Spring Meeting
dc.source.conferencedate25/05/2009
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec


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