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dc.contributor.authorVerbist, Marie
dc.contributor.authorVan Thourhout, Dries
dc.date.accessioned2021-10-18T04:41:49Z
dc.date.available2021-10-18T04:41:49Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16462
dc.sourceIIOimport
dc.titleFocused ion beam etching of thin diamond layers
dc.typeProceedings paper
dc.contributor.imecauthorVan Thourhout, Dries
dc.contributor.orcidimecVan Thourhout, Dries::0000-0003-0111-431X
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage113
dc.source.endpage116
dc.source.conferenceProceedings of the Annual Symposium of the IEEE Photononics Benelux Chapter
dc.source.conferencedate5/11/2009
dc.source.conferencelocationBrussels Belgium
imec.availabilityPublished - open access


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