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Extreme scaling of low-k dielectric for sub 45 nm BEOL roadmaps

dc.contributor.authorVerdonck, Patrick
dc.date.accessioned2021-10-18T04:42:36Z
dc.date.available2021-10-18T04:42:36Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16464
dc.sourceIIOimport
dc.titleExtreme scaling of low-k dielectric for sub 45 nm BEOL roadmaps
dc.typeOral presentation
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.source.peerreviewno
dc.source.conferenceEuropean-Russian Semiconductor Technology Conference on Networking
dc.source.conferencedate3/06/2009
dc.source.conferencelocationMoskou Russia
imec.availabilityPublished - imec


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