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Chemical analysis of nickel silicides with high spatial resolution by combined EDS, EELS and ELNES

dc.contributor.authorVerleysen, Eveline
dc.contributor.authorBender, Hugo
dc.contributor.authorSchryvers, Dominique
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-18T04:51:00Z
dc.date.available2021-10-18T04:51:00Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16483
dc.sourceIIOimport
dc.titleChemical analysis of nickel silicides with high spatial resolution by combined EDS, EELS and ELNES
dc.typeMeeting abstract
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorVandervorst, Wilfried
dc.source.peerreviewno
dc.source.conferenceMicroscopy of Semiconducting Materials Conference - MSMXVI
dc.source.conferencedate17/03/2009
dc.source.conferencelocationOxford UK
imec.availabilityPublished - imec


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