30-nm half-pitch metal patterning using MotifTM critical dimension shrink technique and double patterning

Versluijs, Janko; de Marneffe, Jean-Francois; Goossens, Danny; Vandeweyer, Tom; Wiaux, Vincent; Struyf, Herbert; Maenhoudt, Mireille; Brouri, Mohand; Vertommen, Johan; Kim, Ji Soo; Zhu, Helen; Sadjadi, Reza

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30-nm half-pitch metal patterning using MotifTM critical dimension shrink technique and double patterning

Date

2009

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Versluijs, Janko

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de Marneffe, Jean-Francois

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Journal of Micro/Nanolithography MEMS MOEMS

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30-nm half-pitch metal patterning using MotifTM critical dimension shrink technique and double patterning

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