dc.contributor.author | Wang, Qingfeng | |
dc.contributor.author | Lauwers, Anne | |
dc.contributor.author | Jonckx, Franky | |
dc.contributor.author | de Potter de ten Broeck, Muriel | |
dc.contributor.author | Chen, Chun-Cho | |
dc.contributor.author | Maex, Karen | |
dc.date.accessioned | 2021-09-29T15:51:46Z | |
dc.date.available | 2021-09-29T15:51:46Z | |
dc.date.issued | 1996 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/1649 | |
dc.source | IIOimport | |
dc.title | Manufacturability issues for application of silicides in 0.25 μm CMOS process and beyond | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Lauwers, Anne | |
dc.contributor.imecauthor | de Potter de ten Broeck, Muriel | |
dc.contributor.imecauthor | Maex, Karen | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 221 | |
dc.source.endpage | 231 | |
dc.source.conference | Silicide Thin Films - Fabrication, Properties, and Applications | |
dc.source.conferencedate | 27/11/1995 | |
dc.source.conferencelocation | Boston, MA USA | |
imec.availability | Published - imec | |
imec.internalnotes | MRS Symposium Proceedings; Vol. 402 | |