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The effect of etch-clean delay time on post-etch residue removal for front-end-of-line applications

dc.contributor.authorVos, Ingrid
dc.contributor.authorHellin, David
dc.contributor.authorVereecke, Guy
dc.contributor.authorPavel, Elisabeth
dc.contributor.authorBoullart, Werner
dc.contributor.authorVertommen, Johan
dc.date.accessioned2021-10-18T05:00:39Z
dc.date.available2021-10-18T05:00:39Z
dc.date.issued2009
dc.identifier.issn1071-1023
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16505
dc.sourceIIOimport
dc.titleThe effect of etch-clean delay time on post-etch residue removal for front-end-of-line applications
dc.typeJournal article
dc.contributor.imecauthorVos, Ingrid
dc.contributor.imecauthorHellin, David
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorVertommen, Johan
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.source.peerreviewyes
dc.source.beginpage2301
dc.source.endpage2308
dc.source.journalJournal of Vacuum Science and Technology B
dc.source.issue5
dc.source.volume27
imec.availabilityPublished - imec


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