Toggle navigation
My submissions
Login
Toggle navigation
View item
imec Publications Repository
imec Publications
Articles
View item
imec Publications Repository
imec Publications
Articles
View item
JavaScript is disabled for your browser. Some features of this site may not work without it.
The effect of etch-clean delay time on post-etch residue removal for front-end-of-line applications
Metadata
Show full item record
Authors
Vos, Ingrid
;
Hellin, David
;
Vereecke, Guy
;
Pavel, Elisabeth
;
Boullart, Werner
;
Vertommen, Johan
ISSN
1071-1023
Issue
5
Journal
Journal of Vacuum Science and Technology B
Volume
27
Title
The effect of etch-clean delay time on post-etch residue removal for front-end-of-line applications
Publication type
Journal article
Collections
Articles
Search imec Publications Repository
This collection
Browse
All of imec Publications Repository
Collections
Publication date
Authors
Titles
Subjects
imec author
Availability
Publication type
This collection
Publication date
Authors
Titles
Subjects
imec author
Availability
Publication type
My account
login