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The effect of etch-clean delay time on post-etch residue removal for front-end-of-line applications
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The effect of etch-clean delay time on post-etch residue removal for front-end-of-line applications
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Date
2009
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vos, Ingrid
;
Hellin, David
;
Vereecke, Guy
;
Pavel, Elisabeth
;
Boullart, Werner
;
Vertommen, Johan
Journal
Journal of Vacuum Science and Technology B
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1893
since deposited on 2021-10-18
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Acq. date: 2025-12-11
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Metrics
Views
1893
since deposited on 2021-10-18
1
last month
Acq. date: 2025-12-11
Citations