The effect of etch-clean delay time on post-etch residue removal for front-end-of-line applications

dc.contributor.author	Vos, Ingrid
dc.contributor.author	Hellin, David
dc.contributor.author	Vereecke, Guy
dc.contributor.author	Pavel, Elisabeth
dc.contributor.author	Boullart, Werner
dc.contributor.author	Vertommen, Johan
dc.contributor.imecauthor	Vos, Ingrid
dc.contributor.imecauthor	Hellin, David
dc.contributor.imecauthor	Vereecke, Guy
dc.contributor.imecauthor	Boullart, Werner
dc.contributor.imecauthor	Vertommen, Johan
dc.contributor.orcidimec	Vereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimec	Boullart, Werner::0000-0001-7614-2097
dc.date.accessioned	2021-10-18T05:00:39Z
dc.date.available	2021-10-18T05:00:39Z
dc.date.issued	2009
dc.identifier.issn	1071-1023
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/16505
dc.source.beginpage	2301
dc.source.endpage	2308
dc.source.issue	5
dc.source.journal	Journal of Vacuum Science and Technology B
dc.source.volume	27
dc.title	The effect of etch-clean delay time on post-etch residue removal for front-end-of-line applications
dc.type	Journal article
dspace.entity.type	Publication
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