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Demonstration of a submicron damascene Cu/low-k mechanical sensor to monitor stress in BEOL metallisation

dc.contributor.authorWilson, Chris
dc.contributor.authorCroes, Kristof
dc.contributor.authorTokei, Zsolt
dc.contributor.authorBeyer, Gerald
dc.contributor.authorHorsfall, Horsfall
dc.contributor.authorO'Neill, Anthony G.
dc.date.accessioned2021-10-18T05:17:33Z
dc.date.available2021-10-18T05:17:33Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16543
dc.sourceIIOimport
dc.titleDemonstration of a submicron damascene Cu/low-k mechanical sensor to monitor stress in BEOL metallisation
dc.typeProceedings paper
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorCroes, Kristof
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage31
dc.source.endpage35
dc.source.conferenceIEEE International Conference on Microelectronic Test Structures - ICMTS
dc.source.conferencedate30/03/2009
dc.source.conferencelocationOxnard, CA USA
imec.availabilityPublished - open access


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