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A NEMS based sensor to monitor stress in deep sub-micron Cu/Low-$k$ interconnects

dc.contributor.authorWilson, Chris
dc.contributor.authorCroes, Kristof
dc.contributor.authorVan Cauwenberghe, Marc
dc.contributor.authorTokei, Zsolt
dc.contributor.authorBeyer, Gerald
dc.contributor.authorHorsfall, Alton
dc.contributor.authorO'Neill, Anthony
dc.date.accessioned2021-10-18T05:18:27Z
dc.date.available2021-10-18T05:18:27Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16545
dc.sourceIIOimport
dc.titleA NEMS based sensor to monitor stress in deep sub-micron Cu/Low-$k$ interconnects
dc.typeJournal article
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorCroes, Kristof
dc.contributor.imecauthorVan Cauwenberghe, Marc
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.source.peerreviewno
dc.source.beginpage115018
dc.source.journalSemicond. Sci. Technol.
dc.source.issue11
dc.source.volume24
dc.identifier.urlhttp://stacks.iop.org/0268-1242/24/115018
imec.availabilityPublished - imec


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