dc.contributor.author | Wilson, Chris | |
dc.contributor.author | Zhao, Chao | |
dc.contributor.author | Zhao, Larry | |
dc.contributor.author | Tokei, Zsolt | |
dc.contributor.author | Croes, Kristof | |
dc.contributor.author | Pantouvaki, Marianna | |
dc.contributor.author | Beyer, Gerald | |
dc.contributor.author | Horsfall, A | |
dc.contributor.author | O'Neill, A | |
dc.date.accessioned | 2021-10-18T05:20:50Z | |
dc.date.available | 2021-10-18T05:20:50Z | |
dc.date.issued | 2009 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/16550 | |
dc.source | IIOimport | |
dc.title | Synchrotron measurement of the effect of dielectric porosity and air gaps on the stress in advanced Cu/low-k interconnects | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Wilson, Chris | |
dc.contributor.imecauthor | Tokei, Zsolt | |
dc.contributor.imecauthor | Croes, Kristof | |
dc.contributor.imecauthor | Pantouvaki, Marianna | |
dc.contributor.imecauthor | Beyer, Gerald | |
dc.contributor.orcidimec | Croes, Kristof::0000-0002-3955-0638 | |
dc.source.peerreview | no | |
dc.source.beginpage | 72 | |
dc.source.endpage | 74 | |
dc.source.conference | IEEE Internationa Interconnect Technology Conference - IITC | |
dc.source.conferencedate | 1/06/2009 | |
dc.source.conferencelocation | Sapporo, Hokkaido Japan | |
imec.availability | Published - imec | |