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Alternative double patterning processes: ready for (sub) 32nm hp

dc.contributor.authorWong, Patrick
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorVangoidsenhoven, Diziana
dc.contributor.authorWiaux, Vincent
dc.date.accessioned2021-10-18T05:24:11Z
dc.date.available2021-10-18T05:24:11Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16558
dc.sourceIIOimport
dc.titleAlternative double patterning processes: ready for (sub) 32nm hp
dc.typeProceedings paper
dc.contributor.imecauthorWong, Patrick
dc.contributor.imecauthorVangoidsenhoven, Diziana
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.orcidimecWong, Patrick::0000-0003-3605-9680
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceSemicon Europe - Pushing Lithography to the Limits
dc.source.conferencedate6/10/2009
dc.source.conferencelocationDresden Germany
imec.availabilityPublished - open access
imec.internalnotese-proceedings: http://semieurope.omnibooksonline.com/2009/semicon_europa/


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