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Towards 26nm hp: advances in litho-process-litho

dc.contributor.authorWong, Patrick
dc.contributor.authorVangoidsenhoven, Diziana
dc.contributor.authorMurdoch, Gayle
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorVerhaegen, Staf
dc.contributor.authorWiaux, Vincent
dc.date.accessioned2021-10-18T05:24:37Z
dc.date.available2021-10-18T05:24:37Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16559
dc.sourceIIOimport
dc.titleTowards 26nm hp: advances in litho-process-litho
dc.typeProceedings paper
dc.contributor.imecauthorWong, Patrick
dc.contributor.imecauthorVangoidsenhoven, Diziana
dc.contributor.imecauthorMurdoch, Gayle
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.orcidimecWong, Patrick::0000-0003-3605-9680
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference6th International Symposium on Immersion Lithography Extensions
dc.source.conferencedate22/10/2009
dc.source.conferencelocationPrague Czech Republic
imec.availabilityPublished - open access
imec.internalnotese-proceedings Sematech-website


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