dc.contributor.author | Wostyn, Kurt | |
dc.contributor.author | Wada, Masayuki | |
dc.contributor.author | Andreas, M. | |
dc.contributor.author | Kenis, Karine | |
dc.contributor.author | Roussel, Philippe | |
dc.contributor.author | Bearda, Twan | |
dc.contributor.author | Leunissen, Peter | |
dc.contributor.author | Mertens, Paul | |
dc.date.accessioned | 2021-10-18T05:26:01Z | |
dc.date.available | 2021-10-18T05:26:01Z | |
dc.date.issued | 2009 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/16562 | |
dc.source | IIOimport | |
dc.title | Particle removal and damage thresholds from particle removal and damage formation frequency for high-velocity-aerosol cleaning | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Wostyn, Kurt | |
dc.contributor.imecauthor | Kenis, Karine | |
dc.contributor.imecauthor | Roussel, Philippe | |
dc.contributor.imecauthor | Mertens, Paul | |
dc.contributor.orcidimec | Wostyn, Kurt::0000-0003-3995-0292 | |
dc.contributor.orcidimec | Roussel, Philippe::0000-0002-0402-8225 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 211 | |
dc.source.endpage | 217 | |
dc.source.conference | Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 11 | |
dc.source.conferencedate | 4/10/2009 | |
dc.source.conferencelocation | Vienna Austria | |
imec.availability | Published - open access | |