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Modeling laser bandwidth for OPC applications

dc.contributor.authorZuniga, Christian
dc.contributor.authorAdam, Kostas
dc.contributor.authorLam, Michael
dc.contributor.authorLalovic, Ivan
dc.contributor.authorDe Bisschop, Peter
dc.date.accessioned2021-10-18T05:51:21Z
dc.date.available2021-10-18T05:51:21Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16619
dc.sourceIIOimport
dc.titleModeling laser bandwidth for OPC applications
dc.typeProceedings paper
dc.contributor.imecauthorDe Bisschop, Peter
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage72741O
dc.source.conferenceOptical Microlithography XXII
dc.source.conferencedate22/02/2009
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; vol. 7274


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