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Atomic layer deposition of Gd-doped HfO2 thin films

dc.contributor.authorAdelmann, Christoph
dc.contributor.authorTielens, Hilde
dc.contributor.authorDewulf, Daan
dc.contributor.authorHardy, An
dc.contributor.authorPierreux, Dieter
dc.contributor.authorSwerts, Johan
dc.contributor.authorRosseel, Erik
dc.contributor.authorShi, Xiaoping
dc.contributor.authorVan Bael, Marlies
dc.contributor.authorKittl, Jorge
dc.contributor.authorVan Elshocht, Sven
dc.date.accessioned2021-10-18T15:15:07Z
dc.date.available2021-10-18T15:15:07Z
dc.date.issued2010
dc.identifier.issn0013-4651
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16628
dc.sourceIIOimport
dc.titleAtomic layer deposition of Gd-doped HfO2 thin films
dc.typeJournal article
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorTielens, Hilde
dc.contributor.imecauthorHardy, An
dc.contributor.imecauthorPierreux, Dieter
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorVan Bael, Marlies
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecVan Bael, Marlies::0000-0002-5516-7962
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.source.peerreviewyes
dc.source.beginpageG105
dc.source.endpageG110
dc.source.journalJournal of the Electrochemical Society
dc.source.issue4
dc.source.volume157
dc.identifier.urlhttp://link.aip.org/link/?JES/157/G105
imec.availabilityPublished - imec


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