dc.contributor.author | Adelmann, Christoph | |
dc.contributor.author | Tielens, Hilde | |
dc.contributor.author | Dewulf, Daan | |
dc.contributor.author | Hardy, An | |
dc.contributor.author | Pierreux, Dieter | |
dc.contributor.author | Swerts, Johan | |
dc.contributor.author | Rosseel, Erik | |
dc.contributor.author | Shi, Xiaoping | |
dc.contributor.author | Van Bael, Marlies | |
dc.contributor.author | Kittl, Jorge | |
dc.contributor.author | Van Elshocht, Sven | |
dc.date.accessioned | 2021-10-18T15:15:07Z | |
dc.date.available | 2021-10-18T15:15:07Z | |
dc.date.issued | 2010 | |
dc.identifier.issn | 0013-4651 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/16628 | |
dc.source | IIOimport | |
dc.title | Atomic layer deposition of Gd-doped HfO2 thin films | |
dc.type | Journal article | |
dc.contributor.imecauthor | Adelmann, Christoph | |
dc.contributor.imecauthor | Tielens, Hilde | |
dc.contributor.imecauthor | Hardy, An | |
dc.contributor.imecauthor | Pierreux, Dieter | |
dc.contributor.imecauthor | Swerts, Johan | |
dc.contributor.imecauthor | Rosseel, Erik | |
dc.contributor.imecauthor | Van Bael, Marlies | |
dc.contributor.imecauthor | Van Elshocht, Sven | |
dc.contributor.orcidimec | Adelmann, Christoph::0000-0002-4831-3159 | |
dc.contributor.orcidimec | Van Bael, Marlies::0000-0002-5516-7962 | |
dc.contributor.orcidimec | Van Elshocht, Sven::0000-0002-6512-1909 | |
dc.source.peerreview | yes | |
dc.source.beginpage | G105 | |
dc.source.endpage | G110 | |
dc.source.journal | Journal of the Electrochemical Society | |
dc.source.issue | 4 | |
dc.source.volume | 157 | |
dc.identifier.url | http://link.aip.org/link/?JES/157/G105 | |
imec.availability | Published - imec | |