Show simple item record

Comparison of RCA and IMEC clean (HF last) type cleaning sequences in full production environment

dc.contributor.authorWolke, K.
dc.contributor.authorSchenkl, M.
dc.contributor.authorSilvestre, P.
dc.contributor.authorBellandi, E.
dc.contributor.authorAlessandri, M.
dc.contributor.authorCornelissen, Ingrid
dc.contributor.authorMeuris, Marc
dc.date.accessioned2021-09-29T15:54:18Z
dc.date.available2021-09-29T15:54:18Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1663
dc.sourceIIOimport
dc.titleComparison of RCA and IMEC clean (HF last) type cleaning sequences in full production environment
dc.typeProceedings paper
dc.contributor.imecauthorCornelissen, Ingrid
dc.contributor.imecauthorMeuris, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage199
dc.source.endpage203
dc.source.conferenceProceedings of the 3rd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate23/09/1996
dc.source.conferencelocationAntwerpen Belgium
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
1637.pdf
Size:
261.0Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record