dc.contributor.author | Wolke, K. | |
dc.contributor.author | Schenkl, M. | |
dc.contributor.author | Silvestre, P. | |
dc.contributor.author | Bellandi, E. | |
dc.contributor.author | Alessandri, M. | |
dc.contributor.author | Cornelissen, Ingrid | |
dc.contributor.author | Meuris, Marc | |
dc.date.accessioned | 2021-09-29T15:54:18Z | |
dc.date.available | 2021-09-29T15:54:18Z | |
dc.date.issued | 1996 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/1663 | |
dc.source | IIOimport | |
dc.title | Comparison of RCA and IMEC clean (HF last) type cleaning sequences in full production environment | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Cornelissen, Ingrid | |
dc.contributor.imecauthor | Meuris, Marc | |
dc.contributor.orcidimec | Meuris, Marc::0000-0002-9580-6810 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 199 | |
dc.source.endpage | 203 | |
dc.source.conference | Proceedings of the 3rd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS | |
dc.source.conferencedate | 23/09/1996 | |
dc.source.conferencelocation | Antwerpen Belgium | |
imec.availability | Published - open access | |