Channel hot-carrier degradation in pMOS and nMOS short channel transistors with high-k dielectric stack
dc.contributor.author | Amat, Esteve | |
dc.contributor.author | Kauerauf, Thomas | |
dc.contributor.author | Degraeve, Robin | |
dc.contributor.author | Rodríguez, Rosana | |
dc.contributor.author | Nafría, Montse | |
dc.contributor.author | Aymerich, Xavier | |
dc.contributor.author | Groeseneken, Guido | |
dc.date.accessioned | 2021-10-18T15:15:33Z | |
dc.date.available | 2021-10-18T15:15:33Z | |
dc.date.issued | 2010 | |
dc.identifier.issn | 0167-9317 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/16649 | |
dc.source | IIOimport | |
dc.title | Channel hot-carrier degradation in pMOS and nMOS short channel transistors with high-k dielectric stack | |
dc.type | Journal article | |
dc.contributor.imecauthor | Degraeve, Robin | |
dc.contributor.imecauthor | Groeseneken, Guido | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 47 | |
dc.source.endpage | 50 | |
dc.source.journal | Microelectronic Engineering | |
dc.source.issue | 1 | |
dc.source.volume | 87 | |
imec.availability | Published - open access |