dc.contributor.author | Arora, Rajan | |
dc.contributor.author | Simoen, Eddy | |
dc.contributor.author | Zhang, En Xia | |
dc.contributor.author | Fleetwood, Daniel M. | |
dc.contributor.author | Schrimpf, Ronald D. | |
dc.contributor.author | Galloway, Kenneth F. | |
dc.contributor.author | Choi, Bo K. | |
dc.contributor.author | Mitard, Jerome | |
dc.contributor.author | Meuris, Marc | |
dc.contributor.author | Claeys, Cor | |
dc.contributor.author | Madan, Anuj | |
dc.contributor.author | Cressler, John D. | |
dc.date.accessioned | 2021-10-18T15:16:16Z | |
dc.date.available | 2021-10-18T15:16:16Z | |
dc.date.issued | 2010 | |
dc.identifier.issn | 0018-9499 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/16669 | |
dc.source | IIOimport | |
dc.title | Effects of halo doping and Si capping layer thickness on total-dose effects in Ge p-MOSFETs | |
dc.type | Journal article | |
dc.contributor.imecauthor | Simoen, Eddy | |
dc.contributor.imecauthor | Mitard, Jerome | |
dc.contributor.imecauthor | Meuris, Marc | |
dc.contributor.orcidimec | Simoen, Eddy::0000-0002-5218-4046 | |
dc.contributor.orcidimec | Mitard, Jerome::0000-0002-7422-079X | |
dc.contributor.orcidimec | Meuris, Marc::0000-0002-9580-6810 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 1933 | |
dc.source.endpage | 1939 | |
dc.source.journal | IEEE Transactions on Nuclear Science | |
dc.source.issue | 4 | |
dc.source.volume | 57 | |
imec.availability | Published - open access | |