Publication:

Effects of halo doping and Si capping layer thickness on total-dose effects in Ge p-MOSFETs

Date

2010
Journal article
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Author(s)

Arora, Rajan
;
Simoen, Eddy  
;
Zhang, En Xia
;
Fleetwood, Daniel M.
;
Schrimpf, Ronald D.
;
Galloway, Kenneth F.
;
Choi, Bo K.
;
Mitard, Jerome  
;
Meuris, Marc  
;
Claeys, Cor
;
Madan, Anuj
;
Cressler, John D.

Journal

IEEE Transactions on Nuclear Science

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1911 since deposited on 2021-10-18
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